Effect of temperature and dissolved oxygen on the growth kinetics of Pseudomonas putida F1 growing on benzene and toluene.

Batch experiments were conducted to determine the effect of temperature and dissolved oxygen concentration on the rates of growth and substrate (benzene and toluene) degradation by the toluene degrading strain, Pseudomonas putida F1. Over a range of temperature from 15 to 35 degrees C the maximum specific growth rate followed the Topiwala-Sinclair relationship when either benzene or toluene served as the sole carbon and energy source. Oxygen limited growth followed Monod saturation kinetics with the specific growth rate given as a function of the dissolved oxygen concentration. The oxygen half-saturation coefficient was found to be approximately 1 mg/l regardless of whether benzene or toluene was the substrate. Similar experiments with Burkholderia (Ralstonia) pickettii PKO1 for grown on toluene revealed an oxygen half-saturation coefficient of 0.7 mg/l.