Literature DB >> 12871804

Electron energy-loss spectroscopic profiling of thin film structures: 0.39 nm line resolution and 0.04 eV precision measurement of near-edge structure shifts at interfaces.

T Walther1.   

Abstract

The method of energy-loss spectroscopic profiling of interfaces, planar defects and thin film structures in a transmission electron microscope with an imaging filter is introduced. Ways to calculate true chemical profiles with near-atomic line resolution are described. An application to the perovskite system (La,Ca)MnO(3)/SrTiO(3) demonstrates that the technical merit of this method is the simultaneous achievement of high resolution (down to 0.39nm line resolution), high chemical sensitivity (around 1at% standard deviation) and very high precision in the measurement of shifts of edge onsets and energy-loss near-edge structure details (down to 0.04eV). The combination of these characteristics makes the method a powerful tool for the quantification of diffusion and segregation of elements on the atomic scale in a variety of materials systems.

Entities:  

Year:  2003        PMID: 12871804     DOI: 10.1016/S0304-3991(03)00104-9

Source DB:  PubMed          Journal:  Ultramicroscopy        ISSN: 0304-3991            Impact factor:   2.689


  1 in total

1.  Measurement of Diffusion and Segregation in Semiconductor Quantum Dots and Quantum Wells by Transmission Electron Microscopy: A Guide.

Authors:  Thomas Walther
Journal:  Nanomaterials (Basel)       Date:  2019-06-08       Impact factor: 5.076

  1 in total

北京卡尤迪生物科技股份有限公司 © 2022-2023.