Self-organized superlattice formation during crystal growth from continuous beam fluxes.

Alloy superlattice structures consisting of alternating Si-rich and C-rich layers form spontaneously during gas-source molecular beam epitaxy of Si(1-y)C(y) on Si(001) from constant Si2H6 and CH3SiH3 precursor fluxes at T(s)=725-750 degrees C. The self-organized patterning is due to a complex interaction among competing surface reactions. During growth of the initial Si-rich layer, strain-driven C segregation to the subsurface results in charge transfer from surface Si atom dangling bonds to C backbonds. This decreases the Si2H6 sticking probability, and, hence, the instantaneous deposition rate, thereby enhancing C segregation. The Si-rich layer continues until a critical C coverage is reached allowing nucleation of a C-rich layer which grows until the excess subsurface C is depleted. The process then repeats with periods tunable through the choice of T(s) and y(avg).