Literature DB >> 12805542

The interface phase and the Schottky barrier for a crystalline dielectric on silicon.

R A McKee1, F J Walker, M Buongiorno Nardelli, W A Shelton, G M Stocks.   

Abstract

The barrier height for electron exchange at a dielectric-semiconductor interface has long been interpreted in terms of Schottky's theory with modifications from gap states induced in the semiconductor by the bulk termination. Rather, we show with the structure specifics of heteroepitaxy that the electrostatic boundary conditions can be set in a distinct interface phase that acts as a "Coulomb buffer." This Coulomb buffer is tunable and will functionalize the barrier-height concept itself.

Entities:  

Year:  2003        PMID: 12805542     DOI: 10.1126/science.1083894

Source DB:  PubMed          Journal:  Science        ISSN: 0036-8075            Impact factor:   47.728


  2 in total

Review 1.  Study of Direct-Contact HfO₂/Si Interfaces.

Authors:  Noriyuki Miyata
Journal:  Materials (Basel)       Date:  2012-03-19       Impact factor: 3.623

2.  Electric-field-controlled interface dipole modulation for Si-based memory devices.

Authors:  Noriyuki Miyata
Journal:  Sci Rep       Date:  2018-05-31       Impact factor: 4.379

  2 in total

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