Effects of polarization on laser holography for microstructure fabrication.

We perform a kind of computer stimulation on the multi-laser-beam interference. Using this method, we picture the interference patterns and describe the influence of the polarization of lights upon the clarity of the pattern. We find out the relations between the polarization states of the lights for the case of the best pattern and provide an optimal solution of the polarization on holographic lithography technology, and experiential formulas. This kind of analysis will improve the fabrication of submicrometer periodic structure efficiently.