| Literature DB >> 12696869 |
Toyoshi Shimada1, Kazuko Aoki, Yo Shinoda, Tomoaki Nakamura, Norihito Tokunaga, Shinji Inagaki, Tamio Hayashi.
Abstract
Treatment of an (allyl)organosilane with silica gel in refluxing toluene brought about deallylation forming an Si-O-Si bond with the silicon on the silica gel. This Si-O-Si bond formation provides us with a new reliable method for the functionalization of a silica gel surface.Entities:
Year: 2003 PMID: 12696869 DOI: 10.1021/ja034691l
Source DB: PubMed Journal: J Am Chem Soc ISSN: 0002-7863 Impact factor: 15.419