Literature DB >> 11917133

Magnetic nanodots from atomic Fe: can it be done?

E te Sligte1, R C M Bosch, B Smeets, P van der Straten, H C W Beijerinck, K A H van Leeuwen.   

Abstract

Laser focusing of Fe atoms offers the possibility of creating separate magnetic structures on a scale of 10 nm with exact periodicity. This can be done by using the parabolic minima of the potential generated by a standing light wave as focusing lenses. To achieve the desired 10-nm resolution, we need to suppress chromatic and spherical aberrations, as well as prevent structure broadening caused by the divergence of the incoming beam. Chromatic aberrations are suppressed by the development of a supersonic Fe beam source with speed ratio S = 11 +/- 1. This beam has an intensity of 3 x 10(15) atoms sr(-1) s(-1). The spherical aberrations of the standing light wave will be suppressed by aperturing with beam masks containing 100-nm slits at 744-nm intervals. The beam divergence can be reduced by application of laser cooling to reduce the transverse velocity. We have constructed a laser system capable of delivering over 500 mW of laser light at 372 nm, the wavelength of the (5)D(4) --> (5)F(5) atomic transition of (56)Fe we intend to use for laser cooling. Application of polarization spectroscopy to a hollow cathode discharge results in a locking system holding the laser continuously within 2 MHz of the desired frequency.

Entities:  

Year:  2002        PMID: 11917133      PMCID: PMC128559          DOI: 10.1073/pnas.072525199

Source DB:  PubMed          Journal:  Proc Natl Acad Sci U S A        ISSN: 0027-8424            Impact factor:   11.205


  4 in total

1.  Using light as a lens for submicron, neutral-atom lithography.

Authors: 
Journal:  Phys Rev Lett       Date:  1992-09-14       Impact factor: 9.161

2.  Laser-focused atomic deposition.

Authors:  J J McClelland; R E Scholten; E C Palm; R J Celotta
Journal:  Science       Date:  1993-11-05       Impact factor: 47.728

3.  Light force cooling, focusing, and nanometer-scale deposition of aluminum atoms.

Authors:  R W McGowan; D M Giltner; S A Lee
Journal:  Opt Lett       Date:  1995-12-15       Impact factor: 3.776

4.  Microlithography by using neutral metastable atoms and self-assembled monolayers.

Authors:  K K Berggren; A Bard; J L Wilbur; J D Gillaspy; A G Helg; J J McClelland; S L Rolston; W D Phillips; M Prentiss; G M Whitesides
Journal:  Science       Date:  1995-09-01       Impact factor: 47.728

  4 in total

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