Literature DB >> 1148111

Photochemistry of tetrachlorosalicylanilide and its relevance to the persistent light reactor.

A K Davies, N S Hilal, J F McKellar, G O Phillips.   

Abstract

The photochemistry of 3,5,3',4'-tetrachlorosalicylanilide has been studied in solution under carefully controlled conditions. When irradiated in a buffered solution of pH 7.4 (physiological pH), three atoms of chlorine are liberated from the molecule instead of one as suggested by earlier photochemical work. From this observation a mechanism is proposed to explain the long-term photobiological effect of this compound in skin i.e. that of the persistent light reactor.

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Year:  1975        PMID: 1148111     DOI: 10.1111/j.1365-2133.1975.tb03050.x

Source DB:  PubMed          Journal:  Br J Dermatol        ISSN: 0007-0963            Impact factor:   9.302


  2 in total

1.  From fentichlor sensitivity to actinic reticuloid?

Authors:  R Clayton
Journal:  Proc R Soc Med       Date:  1976-05

Review 2.  Drug-induced cutaneous photosensitivity: incidence, mechanism, prevention and management.

Authors:  Douglas E Moore
Journal:  Drug Saf       Date:  2002       Impact factor: 5.606

  2 in total

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