| Literature DB >> 11415301 |
X X Zhang1, C Wan, H Liu, Z Q Li, P Sheng, J J Lin.
Abstract
Nearly 3 orders of magnitude enhancement in the Hall coefficient is observed in Cu(x)-(SiO(2))(1--x) granular films. This large enhancement of the Hall coefficient not only is significantly larger than the prediction of the classical percolation theory, but also occurs at a metal concentration identified to be the quantum percolation threshold. Measurements of the electron dephasing length and magnetoresistance, plus the TEM characterization of microstructures, yield a physical picture consistent with the mechanism of the local quantum interference effect.Entities:
Year: 2001 PMID: 11415301 DOI: 10.1103/PhysRevLett.86.5562
Source DB: PubMed Journal: Phys Rev Lett ISSN: 0031-9007 Impact factor: 9.161