Literature DB >> 11169173

Five cases of photocontact dermatitis due to topical ketoprofen: photopatch testing and cross-reaction study.

T Matsushita1, R Kamide.   

Abstract

BACKGROUND: In parallel with the popular usage of topical ketoprofen, the number of reported cases of ketoprofen-induced photoallergic contact dermatitis has been increasing. It is clinically important to know the cross-reactivity of ketoprofen in order to avoid cross-sensitization caused by several structurally similar non-steroidal anti-inflammatory drugs (NSAID) on the market.
METHODS: To evaluate the spectrum of cross sensitization, photopatch testing was performed on five patients with ketoprofen-induced photoallergic contact dermatitis using ketoprofen and other structurally similar chemicals, such as oxybenzone, tiaprofenic acid and suprofen.
RESULTS: All five patients reacted positively to ketoprofen or ketoprofen plaster on photopatch testing. All four patients photopatch tested with related chemicals showed cross-photosensitization with tiaprofenic acid and suprofen. However, none of the patients reacted positively to oxybenzone.
CONCLUSION: Either the diphenylketone moiety or a structurally similar tiophene-phenylketone moiety is important as the antigenic determinants of ketoprofen photoallergy. The arylpropionic acid side chain would not be involved.

Entities:  

Mesh:

Substances:

Year:  2001        PMID: 11169173     DOI: 10.1034/j.1600-0781.2001.017001026.x

Source DB:  PubMed          Journal:  Photodermatol Photoimmunol Photomed        ISSN: 0905-4383            Impact factor:   3.135


  1 in total

1.  Review of allergic and photoallergic contact dermatitis from an ingredient in a medicament vehicle consisting of a compress, poultice, plaster, and tape.

Authors:  Naoki Oiso; Akira Kawada
Journal:  J Allergy (Cairo)       Date:  2011-04-06
  1 in total

北京卡尤迪生物科技股份有限公司 © 2022-2023.