H2O2/UV/air oxidation of organic contaminants in the gas-sparged cyclone reactor.

In the last decade advanced oxidation processes (AOPs) have been gaining importance for destruction of waste as cleaner methods enabling conversion of organic contaminants to harmless species. Photodegradation processes in the presence of hydrogen peroxide (H2O2), ozone (O3) and titanium dioxide (TiO2) are most frequently offered for wastewater treatment. The novel gas-sparged reactor equipped with UV lamp proved to be an efficient system for photochemical degradation. In this investigation 80 ppm aqueous solution of phenol was treated for 40 minutes. 13% of phenol was eliminated in the UV/air system and 73% in the UV/H2 O2/air system at 80 l/min air flowrate. Air sparging did not result in phenol removal with the gas phase.