Literature DB >> 10053954

Defect production and annealing in ion-implanted amorphous silicon.

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Abstract

Entities:  

Year:  1993        PMID： 10053954     DOI： 10.1103/PhysRevLett.70.3756

Source DB:  PubMed          Journal:  Phys Rev Lett        ISSN： 0031-9007            Impact factor:   9.161


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  1 in total

1.  In-situ Measurement of Self-Atom Diffusion in Solids Using Amorphous Germanium as a Model System.

Authors:  Erwin Hüger; Florian Strauß; Jochen Stahn; Joachim Deubener; Michael Bruns; Harald Schmidt
Journal:  Sci Rep       Date:  2018-12-04       Impact factor: 4.379
  1 in total

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