Literature DB >> 10041562

New insight into silicide formation: The creation of silicon self-interstitials.

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Abstract

Entities:  

Year:  1990        PMID： 10041562     DOI： 10.1103/PhysRevLett.64.2042

Source DB:  PubMed          Journal:  Phys Rev Lett        ISSN： 0031-9007            Impact factor:   9.161


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  1 in total

1.  The role of Si interstitials in the migration and growth of Ge nanocrystallites under thermal annealing in an oxidizing ambient.

Authors:  Kuan-Hung Chen; Ching-Chi Wang; Tom George; Pei-Wen Li
Journal:  Nanoscale Res Lett       Date:  2014-07-07       Impact factor: 4.703
  1 in total

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